| CH2Cl2: | Dichloromethane; Methylene Chloride. Solvent. Related to chloroform (trichloromethane). |
| CH3CN: | |
| Et2O: | (C2H5)2O; Diethyl Ether. Solvent. Peroxidizes on exposure to air, dangerous. |
| EtOH: | C2H5OH; Ethanol; Ethyl Alcohol. Solvent. |
| H2O: | Hydrogen oxide; Water. Solvent. |
| H2SO4: | Sulfuric Acid. Strong Acid. |
| HCl: | Hydrochloric Acid; Muriatic Acid. Strong acid. |
| He: | Helium gas. Inert Atmosphere. |
| IPA: | C3H7OH; Isopropanol; Isopropyl Alcohol. Solvent. |
| KOH: | Potassium Hydroxide. Strong Base. |
| K2CO3: | Potassium Carbonate; Potash. Weak Base. |
| LAH: | LiAlH4; Lithium Aluminum Hydride. Reducing Agent. Explodes on contact with water -- used only under N2 atmosphere. Extremely dangerous. |
| MeOH: | CH3OH; Methanol; Methyl Alcohol. Solvent. |
| N2: | Nitrogen gas. Inert Atmosphere. |
| NaBH3CN: | Sodium Cyanoborohydride. Reducing Agent. |
| Na2CO3: | Sodium Carbonate; Soda Ash. Weak Base. |
| NMR: | Proton Nuclear Magnetic Resonance Spectroscopy. Analytical technique to determine structure of a compound. |
| NaOH: | Sodium Hydroxide; Lye. Strong Base. |
| POCl3: | Phosphorous Oxychloride. Reducing Agent. |
| THF: | C4H8O; Tetrahydrofuran (cyclized diethyl ether). Solvent. Peroxidizes on exposure to air, perhaps slightly more dangerous than Et2O. |
| TLC: | Thin-Layer Chromatography. Analytical technique to determine composition of a sample. |
